MINA-NEWS #18 - February 2012

CIME gets injection MOCVD capabilities

Since the beginning of this year CIME Nanotech has been breaking in its new injection MOCVD (metal organic chemical vapor deposition) equipment. The main difference with traditional MOCVD is the injector, which sends a pulsed spray of fine droplets of the precursor into the deposition chamber. The precursor is first dissolved in an appropriate solvent, and is then maintained at room temperature for greater stability. The injector is used to control growth rates to a high degree of precision.
The new equipment deposits metals (silver or platinum, for example) or amorphous or crystallized metal oxides (such as yttrium, pewter, aluminum, or silicon, but also supraconducting, ferromagnetic, ferroelectric, and piezoelectric materials). It belongs to FMNT (the Federation for Micro and Nanotechnologies) and is currently being used by LGMP for a Minalogic project.

Contact: carmen.jimenez@grenoble-inp.fr
 

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