DNA origami based lithography

Published : 13 December 2016

The nanoscience and nano technology development determine the continual device miniaturisation. Until now, lithography has been the main driving force of this process. Currently chemically amplified photo resists (CAR) for conventional 193nm immersion lithography applications, are used in manufacturing processes to pattern features with dimensions as small as 45nm to 65nm but may not be extendable as feature dimensions shrink to 32 nm and below. The main obstacle to improve resolution remains the inherent limitation of optical lithography and high cost of lithographic production tools. DNA origami based lithography have become of great interest for high-resolution patterning due to of their facility, elegance and high throughput. Self-assembling materials used in conjunction with the most advanced exposure tools may enable extension of current manufacturing practices to dimensions of 10 nm and less.

The CEA-LETI propose to implement a new nano-patterning hybrid process by combining conventional lithography and self-assembly of DNA origami. Several aspects will be addressed such as deterministic control of DNA origami by locally controlling the surface properties and pattern transfer into the under layer

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