Study of DNA origami–surface interactions for application in lithography

Published : 27 February 2019

In nanotechnology in general and semiconductor industry in particular, there is an ever increasing need for smaller and more complex features at an ever lower cost. Some examples of applications are sub-10 nm features for creation of FinFETs, lateral (horizontal) and vertical gate-all around nanowires, single electron transistors and advanced non-volatile memories (STT-RAM, MRAM, OxRAM, etc.).

To address the challenge of patterning at sub-10 nm features novel patterning approaches must be envisioned. DNA (deoxyribonucleic acid), by virtue of its inherent small diameter (2 nm), tendency to self-organize into various different morphologies and its possibilities for functionalization, offers the possibility to realize both two- and three dimensional structures at nanometer scale.

The goal of this PhD work is to demonstrate the feasibility of nanostructuring the surface of a substrate using DNA origami as a mask, with an ultimate resolution of a few nanometer, with a density that is above the current state of the art in semiconductor industry. The focus of the internship will lie on ever more complex features, while ensuring long-range order by conventional lithography guide patterns. The last part of the thesis consists of the effective transfer of the DNA pattern into the substrate.

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