Actualités : Technologies micro et nano

Context And background : LCFC Lab offers a complete RGA testing solution for outgassing and hermetic studies of microelectronic and MEMS package cavities. Two ultra high vacuum apparatus has been developed as well as a devoted software package for qualitative and quantitative RGA data analysis. To strengthen the RGA activity, software optimization and improvement is […] >>

Context : 3D sequential integration enables to achieve the highest 3D contact density between stacked levels compared to other existing techniques. However it requires to process stacked devices with a limited thermal budget. Leti institute is pioneer in this domain and has a unique expertise on low temperature devices for computing applications. This internship’s goal […] >>

Context : Parasitic resistances and capacitances in integrated circuit produce circuit performance degradations (i.e speed and power consumption) when CMOS technologies are scaling down. They also need to be accounted accurately while designing Non Volatile Memory (NVM) advanced circuit for neuromorphic applications or high power circuit with GaN technology to anticipate heating effect. Parasitic elements […] >>

Cadre et contexte: Depuis la découverte du graphène (prix Nobel 2010), l’engouement pour les matériaux 2D n’a cessé de croitre. En effet, ces matériaux présentent des propriétés très particulières et sont donc des candidats sérieux pour la miniaturisation de l’électronique et l’économie d’énergie ainsi que pour les applications flexibles. Le stage porte sur l’étude du […] >>

The near future is Internet of Things (IoT), with the need of a data storage infrastructure allowing Big Data processing and Artificial Intelligence (AI) applications. The Memory Laboratory in CEA-LETI is developing the next generations of Non-Volatile Memories, and among them Phase-Change Memory (PCM) is the most mature one. PCM demonstrated capability of high data […] >>