Atomic layer deposition (ALD) seminar to come to Grenoble

Categorie(s) : MINATEC, News, Research

Published : 5 October 2015

Atomic layer deposition, or ALD, will be the central topic at RAFALD, a three-day workshop organized from November 16–18 by several Grenoble-based ALD experts. On the docket: materials, equipment, processes, and simulation—all for an audience of professionals from industry and academia plus students enrolled in engineering programs. 50 to 100 attendees are expected.

ALD is used extensively in microelectronics and Grenoble, home to some top-notch equipment and facilities, has become one of France’s major ALD centers. The organizers are planning to build on this workshop—the first national event of its kind in France—to launch a national network dedicated to ALD. The new network could reach beyond microelectronics, attracting professionals from the energy, textile, biology, and organic electronics sectors.



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