CIME Nanotech gets new CVD equipment

CIME Nanotech now has a new CVD (chemical vapor deposition) machine. The machine will be used for microelectronics, photovoltaics, and spintronics courses and will also be available for use by academic research labs.

The machine can be used to deposit thin layers onto four-inch silicon wafers and smaller samples. Worth noting is the fact that it has two chambers—one for metals and another for dielectric and magnetic materials—to reduce the risk of cross-contamination. One of the chambers also has an oxygen inlet for oxidized deposition.

Contact: delphine.constantin@grenoble-inp.fr

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