LMGP takes atomic layer deposition to the next level
Categorie(s) : News, Research
Published : 3 October 2016
At the end of September LMGP presented its new SALD (Spatial Atomic Layer Deposition) reactor to MINATEC. It is the first reactor of its kind in France. It operates at atmospheric pressure, bringing down costs, and can perform atomic layer deposition up to 100 times faster than traditional ALD equipment.
And the resulting layers are both very thin—from a few to a few hundred nanometers—and homogeneous, characteristics that take the lab equipment one step closer to where it needs to be for industrial-scale use.
The new reactor is well-suited for encapsulating systems and for interface engineering (anti-corrosion protection, barrier materials, etc.). INES (France’s solar-energy research organization) is using the reactor to deposit electrode materials onto solar cells under the Institut Carnot Energies du futur project.